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Photoresist Processing | Trouble-Shooting | Etchants and Solvents |  |
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| Strange Appearance (Color, Particles) of the Resist (Film)… | Bubbles in the Resist Film? | Development Rate too low | Dark Erosion too high | Lift-off does not work (well) | Inferior Resist Adhesion |
| Unsuited Substrate Pretreatment? | Using Image Reversal Resists? | Transparent/Highly reflective Substrates? | During Wet chemical Etching... | During Etching with HF |