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Photoresist Processing | Trouble-Shooting | Etchants and Solvents | ![]() |
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| Photoresists | Ancillaries | Storage/Handling/Ageing | Substrate Pre-Treatment and Coating | Baking Steps | Exposure | Development | Coating and Lift-off | Etching and Stripping |
| Photoresists | Ageing of Photoresist | Developer |
| The ageing of developers (=aqueous alkaline solutions) originates from CO2-absorption from air, decreasing the developer activity and the development rate. Therefore, we recommend a storage in well-closed original containments. In case of open developer baths over a period of several days, a N2-stream minimizes the CO2-absorption. Certain developers (e.g. AZ® 400K, AZ® 351B) contain chemical buffers which enable a constant development rate over a long time span as compared with simple NaOH/KOH solutions. |
Overview: Developer (Metal Ion containing) |
Overview: Developer (Metal Ion free) |
| MicroChemicals® - All you need for microstructuring with short lead times also in small sales volumes:Photoresists (positive, negative, image reversal, thin and
thick resists, spray resists, protective coating ...) Ancillaries ( developers, thinner, adhesion promoter such as HMDS, remover) Etchants (acids and the ready-to-use etching mixtures aluminium etch, chromium etch, gold etch und silicon etch) Solvents (acetone, isopropyl alcohol, MEK ... in VLSI and ULSI quality) |