NMP (1-Methyl-2-pyrrolidon) is a powerful stripper due to its physical properties: NMP yields a low vapour pressure (no striation formation), strongly solves organic impurities as well as resists, keeps the removed resist in solution, and can be heated to 80°C due to its high boiling point.

Alkaline Solutions: If the alkaline stability of the substrate is high enough, aqueous alkaline solutions such as 2-3 % KOH or NaOH (= typical developer concentrates) can be used as remover. For highly cross-linked resists, higher concentrations or/and elevated temperatures might be required.

AZ^® 100 Remover is an amine-solvent mixture, and a ready-to-use standard remover for AZ^® and TI photoresists. In order to improve its performance, AZ^® 100 Remover can be heated to 60°C. Since AZ^® 100 Remover is strongly alkaline, aluminium containing substrates might be attacked as well as copper- oder GaAs alloys/compounds. In this case, AZ^® 100 Remover should be used as concentrate, any dilution or contamination (even in traces!) of AZ^® 100 Remover with should be avoided.